发明名称 |
Adding water in plasma-aided coating process |
摘要 |
The method concerns coating of substrates (5, 5', 5", ...) in a vacuum chamber (4) with a substrate carrier (12), means for generating coating materials from a gas phase, means for producing a plasma cloud, and pipes (19, 26) for delivery of gases. The pipe (26) for delivery of a reactive gas or a gas mixture also contains water which is partially ionised and/or partially dissociated. The resultant layers on substrates have reduced stresses and a high elasticity. Also claimed is an appts. which characterised by the presence of at least one additional pipe (26) which leads into the process chamber, is provided with a flow control unit and is connected to a water tank (34).
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申请公布号 |
DE19513097(A1) |
申请公布日期 |
1996.10.10 |
申请号 |
DE19951013097 |
申请日期 |
1995.04.07 |
申请人 |
LEYBOLD AG, 63450 HANAU, DE |
发明人 |
ZOELLER, ALFONS, 63628 BAD SODEN-SALMUENSTER, DE;SCHNEIDER, ROLAND, 63450 HANAU, DE |
分类号 |
C03C17/34;C23C14/00;C23C14/08;C23C14/10;C23C14/22;(IPC1-7):C23C14/24;C03C17/09;C23C14/06;C23C14/20 |
主分类号 |
C03C17/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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