发明名称 Adding water in plasma-aided coating process
摘要 The method concerns coating of substrates (5, 5', 5", ...) in a vacuum chamber (4) with a substrate carrier (12), means for generating coating materials from a gas phase, means for producing a plasma cloud, and pipes (19, 26) for delivery of gases. The pipe (26) for delivery of a reactive gas or a gas mixture also contains water which is partially ionised and/or partially dissociated. The resultant layers on substrates have reduced stresses and a high elasticity. Also claimed is an appts. which characterised by the presence of at least one additional pipe (26) which leads into the process chamber, is provided with a flow control unit and is connected to a water tank (34).
申请公布号 DE19513097(A1) 申请公布日期 1996.10.10
申请号 DE19951013097 申请日期 1995.04.07
申请人 LEYBOLD AG, 63450 HANAU, DE 发明人 ZOELLER, ALFONS, 63628 BAD SODEN-SALMUENSTER, DE;SCHNEIDER, ROLAND, 63450 HANAU, DE
分类号 C03C17/34;C23C14/00;C23C14/08;C23C14/10;C23C14/22;(IPC1-7):C23C14/24;C03C17/09;C23C14/06;C23C14/20 主分类号 C03C17/34
代理机构 代理人
主权项
地址