| 摘要 |
Eddy current apparatus is disclosed for applying a force to a conductive material. The apparatus employs two magnetic fields. The first, a background or soaking field, is continuous or slow rising and has a skin depth that is greater than the dimension of the material in the direction of field penetration. The second is fast-rising and has a skin depth that is less than said dimension. The two fields are timed or phased and oriented with respect to each other to produce the force in a desired direction. Thus, the conductive material can be particles in a slurry or a sheet of conductive material and the force applied thereto can be toward or away from the field source depending upon the timing or phasing of the fields and the orientation thereof.
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