发明名称 WATERBORNE PHOTOSENSITIVE RESIN COMPOSITION
摘要 A water-base photosensitive resin composition which has satisfactory resist properties equal or superior to those of solvent-base photosensitive resin compositions currently in commercial use and is developable with a dilute aqueous alkali solution. The composition comprises as the essential components: (a) an aqueous emulsion of a polymeric compound containing carboxyl groups; (b) a compound having a photopolymerizable ethylenically unsaturated bond; and (c) a photopolymerization initiator capable of generating free radicals upon exposure to actinic light, the component (a) having a weight average molecular weight in the range of from 1,000 to 50,000, an acid value in the range of from 40 to 140 mg-KOH/g, and a glass transition temperature in the range of from 50 to 200 ~C.
申请公布号 CA2215420(A1) 申请公布日期 1996.10.03
申请号 CA19962215420 申请日期 1996.03.28
申请人 NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION 发明人 BECKNELL, ALAN FREDERICK;HAGIWARA, YOSHICHI;SAMUKAWA, HIROSHI;HALLOCK, JOHN SCOTT;SAIGOU, TSUYOSHI
分类号 G03F7/028;H05K3/06;(IPC1-7):G03F7/028 主分类号 G03F7/028
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