| 摘要 |
<p>An improved slit valve door (51) for sealing an aperture (19) in the wall (24) of a semiconductor process chamber. The slit valve door (51) consists of an aperture cover plate (52) with a recess (56) in it for receiving a removable insert (54). An O-ring seal is placed over the insert, and when the insert (54) is placed in the recess (56) of the aperture cover plate (52), the O-ring (30) moves into an O-ring seat (62) in the aperture cover plate (52). As the insert (54) seats in the recess (56) and is secured to the cover plate (52) by means of screws (74) protruding from the floor of the recess (56), a dovetail groove is formed which retains the O-ring (30). <IMAGE></p> |
