| 摘要 |
<p>A sputtering target contains a target material including as constituent elements Ag, In, Te and Sb with the respective atomic percents (atom.%) of alpha , beta , gamma and delta thereof being in the relationship of 0.5 </= alpha < 8, 5 </= beta </= 23, 17 </= gamma </= 38, 32 </= delta </= 73, alpha </= beta , and alpha + beta + gamma + delta = 100, and a method of producing the above sputtering target is provided. An optical recording medium includes a recording layer containing a phase-change recording material which includes as constituent elements Ag, In, Te and Sb with the respective atomic percents of alpha , beta , gamma and delta thereof being in the relationship of 1 </= alpha < 6, 7 </= beta </= 20, 20 </= gamma </= 35, 35 </= delta </= 70, and alpha + beta + gamma + delta = 100, and is capable of recording and erasing information by utilizing the phase change of the recording material in the recording layer. A method of forming the above recording layer for the optical recording medium is also provided. In addition, there is provided an optical recording method using the above-mentioned phase-change optical recording medium.</p> |
| 申请人 |
RICOH COMPANY, LTD |
发明人 |
IDE, YUKIO;IWASAKI, HIROKO;KAGEYAMA, YOSHIYUKI;KANEKO, YUJIRO;YAMADA, KATSUYUKI;SHINOTSUKA, MICHIAKI;HARIGAYA, MAKOTO;DEGUCHI, HIROSHI |
