PATTERN DEFECT INSPECTION METHOD AND DEVICE THEREFOR

摘要

PURPOSE: To provide a pattern defect inspection method and a device therefor with high sensitivity by a die-to-data base inspection method even when a sample is such a substance as a phase shift mask. CONSTITUTION: In this pattern defect inspection device, designed pattern data is developed to a bit image by a bit developing circuit 11 and reference data obtained by performing fixed processing to the developed bit image data is compared with measured pattern data obtained from a sensor circuit 6 by a comparator circuit 8 so as to decide the existence of the defect of the pattern formed on the sample 2. The device is provided with a pattern correction circuit 31 for giving data obtained by performing correction in accordance with the optical characteristic of the light shielding part constituting material of the pattern formed on the sample 2 corresponding to the acquired form of the measured pattern data to the bit image data to the comparator circuit 8 as the reference data.