Electrolytic chromium plating method using trivalent chromium

摘要

A chromium plating method using a plating bath comprising trivalent chromium and an electrode which is an anode comprising an electrode substrate of titanium, tantalum, zirconium, niobium or an alloy thereof, coated with an electrode catalyst comprising at least iridium oxide and, optionally, at least one of titanium, tantalum, niobium, zirconium, tin, antimony, ruthenium, platinum, cobalt, molybdenum, tungsten or an oxide thereof. The anode may be placed directly in the chromium plating bath or may be placed in an anode chamber partitioned from the chromium plating bath with an ion-exchange membrane. The chromium plating method may be a barrel plating method.