| 摘要 |
Embodiments are shown and described of an electrode biasing scheme and developer design for use with liquid electrophotographic imaging machines. The biasing scheme includes a bi-modal charge transport characteristic, wherein the time constant for reverse-plating is prolonged compared to the time constant for forward-plating. This characteristic may be achieved with a diode between the developer electrode and bias voltage source. The preferred developer design is a micro-developer, having a plurality of electrode micro-regions that each adapt in bias to match the photoconductor voltage profile. The invented developer electrode design significantly reduces the backplating of toner on the electrode surface, and can be used to lengthen the available development time period for a given electrophotographic process.
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