| 摘要 |
PURPOSE: To produce an ink jet recording head equipped with fine ink emitting orifices (nozzles) high in reliability. CONSTITUTION: A positive type photoresist 2 is applied to a glass substrate 1 to be treated having an ink emitting heater formed thereto in a film thickness of 10μm by spin coating and prebaked in an oven at 90 deg.C for 20min to form a resist pattern 4 which is, in turn, patternwise exposed through a nozzle pattern mask in exposure quantity of 90mJ/cm<2> by a mask aligner and developed by a 0.75wt.% NaOH aq. soln. Next, the substrate 1 to be treated to which rinsing treatment is applied using ion exchange water is post-baked at 70 deg.C for 30min. in an oven and exposed over the entire surface thereof in exposure quantity of 150mJ/cm<2> and degassed for 30min under vacuum of 0.1mmHg. |
