发明名称 METHOD AND EQUIPMENT FOR SUBSTRATE THERMOMETRY
摘要 PROBLEM TO BE SOLVED: To obtain the indication value of the accurate temperature of a substrate, by heating the substrate up to a process temperature, measuring the substrate temperature by first and second probes with a different effective reflection factor, and deriving a compensation value for the first probe from first and second temperatures. SOLUTION: When an in-situ temperature correction is made, the temperature is measured normally by a probe with the largest effective reflection factor, for example a probe 150, and another probe 152 is used as a correction probe. During a temperature sequence, the probes 150 and 152 extract a radiation energy near the local region of a substrate. Radiation energy strengths I1 and I2 are obtained from an expression I and an emissivityεof an actual substrate is obtained from an expression II using measurement temperatures T1 and T2 for each probe. Then, an effective emissivityε1 of the base probe 150 is calculated from an expression III and a correction temperature Tcorr is calculated from the measurement temperature T1 of the probe 150 using the expression III. In this case, C1 and C2 are known constants, R1 and R2 are effective reflection factors, andλis a radiation wavelength.
申请公布号 JPH08255800(A) 申请公布日期 1996.10.01
申请号 JP19950330494 申请日期 1995.12.19
申请人 APPLIED MATERIALS INC 发明人 BURUUSU DABURIYUU PEUSU;GARII II MAINAA;MAAKU YAMU
分类号 H01L21/205;G01J5/00;G01J5/02;G01J5/04;H01L21/26;H01L21/31;H01L21/324;(IPC1-7):H01L21/324 主分类号 H01L21/205
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