发明名称 Photographic light-sensitive material with polyoxyalkylene antistatic compound
摘要 A photographic silver halide material is disclosed which comprises a support and on one or both sides thereof at least one silver halide emulsion layer and a protective gelatin antistress layer and which comprises in an outermost layer on the side(s) containing at least one emulsion layer a polyoxyalkylene compound as an antistatic agent, characterised in that said antistress layer comprises an ionic or nonionic polymer or copolymer latex. In addition to the preservation of antistatic properties after processing of the said material an improvement in surface glare as appreciated upon examination of medical X-ray films is obtained. Moreover the occurrence after processing of water spot defects and sticking is avoided.
申请公布号 US5561032(A) 申请公布日期 1996.10.01
申请号 US19940304552 申请日期 1994.09.12
申请人 AGFA-GEVAERT, N.V. 发明人 VANDENABEELE, HUBERT
分类号 G03C1/00;G03C1/04;G03C1/043;G03C1/76;G03C1/83;G03C1/85;G03C1/95;G03C5/16;(IPC1-7):G03C1/83 主分类号 G03C1/00
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