| 摘要 |
<p>PURPOSE: To keep the balance of the image intensity of a cyclic pattern and an isolated pattern in a exposure method which is a combination of a Levenson method and a half tone method. CONSTITUTION: In an exposure mask in which a mask pattern composed of a translucent phase shifter 102 and a semitransparent phase shifter 103 are formed on a translucent board 101, the phase shifters 102, 103 give the respective phase differences of 180 degrees to exposure lights passing through the respective patterns. In a line and space portion, the phase shifter 102 is formed only in one line of adjoining lines, a space is divided into two areas, one of which is an area made of the phase shifter 103, and the other of which is an overlapped area of the shifters 102, 103, and the separated areas each have a phase difference of 180 degrees from adjacent lines against the exposure lights. In an isolated portion, the overlapped area of the phase shifters 102, 103 is formed in the periphery of an opening portion 104, and the area made of only the phase shifter 103 is formed outside the overlapped area.</p> |
