发明名称 SUBSTRATE ALIGNING APPARATUS
摘要 <p>PURPOSE: To prevent the generation of particles from the contact parts with a substrate even if the substrate aligning action is repeatedly performed and to prevent the formation of recess parts at the contact parts. CONSTITUTION: A pair of guide members 54 and 56 rotatably support contact rollers 54a and 56a and make the rollers advance and retreat to and from an aligning opening 2a of a cassette 2. Therefore, the contact rollers 54a and 56a in contact with rectangular substrates W are rotated when the rectangular substrates W are aligned. Thus, the abrasion caused by the contacts between the rectangular substrates W and the contact rollers W can be decreased, and the generation of particles can be suppressed. Furthermore, since the contact rollers 54a and 56a are rotated for every alignment of the rectangular substrates W, the contact parts of the outer surfaces of the contact rollers 54a and 56a with the rectangular substrates W are always fluctuated. Thus, the generation of the abrasion and the recess parts caused by the contact and compression at these parts can be suppressed. The generation of the particles can be suppressed, and the alignment of the rectangular substrates W can be made more accurate at the same time.</p>
申请公布号 JPH08250576(A) 申请公布日期 1996.09.27
申请号 JP19950051366 申请日期 1995.03.10
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 TANIGUCHI SATOSHI;SHIMA YASUMASA;SHIMAJI KATSUMI
分类号 H01L21/68;G03F7/20;H01L21/673;(IPC1-7):H01L21/68 主分类号 H01L21/68
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