SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND PHOTOMASK FOR MANUFACTURING THE DEVICE

摘要

PURPOSE: To provide a semiconductor device manufacturing method by which the degradation of precision owing to thermal contraction of the substrate is prevented and hence a superior semiconductor device in characteristics is manufactured and to provide a photomask for manufacturing the device. CONSTITUTION: The magnification of a pattern 4a of the photomask 5a for forming an active region 11 is different from that of patterns 4b, 4c of the photomasks 5b, 5c for forming a gate electrode 12 and making a contact hole. Through the step a pattern can be formed according to thermal contraction of a substrate 10 caused at a forming step of a pattern insulating film 14.