| 摘要 |
PURPOSE: To provide a mask which prevent a minute slip between a mask and a stage holder so as to improve pattern position accuracy. CONSTITUTION: A mask 1, on the surface of which a pattern of an arbitrary shape is formed so that the pattern is transferred to a substrate, is made of, as for one example, a square transparent board 2, for instance, like a quartz glass, and on the sides of the square transparent substrate 2 grooves 3 are formed, for instance, at confronting two positions. Since the grooves 3 are formed in the side faces of the mask 1 like this, pattern forming is conducted in a state that the grooves 3 are retained by a retaining tool so that a minute slip between the mask 1 and a stage holder is prevented to be capable of improving pattern position accuracy. In an inspection process, a correction process, and an exposure process after a pattern forming process similar effect is obtained. |
