发明名称 Appts. for producing reactive gas
摘要 The method concerns production of reactive gases, according to which the gas stream flowing to an adjacent reaction space is subjected to high-frequency or microwave radiation. It is characterised by the fact that the direction of the gas flow in the region of plasma generation is substantially either in or opposite to the direction of radiation propagation. Also claimed is an appts. for implementation of the proposed method.
申请公布号 DE19510827(A1) 申请公布日期 1996.09.26
申请号 DE19951010827 申请日期 1995.03.24
申请人 CELSIS GESELLSCHAFT ZUR ANWENDUNG DER MIKROELEKTRONIK MBH, 18356 BARTH, DE 发明人 FIEBIG, BIRGIT, 79280 AU, DE;GEISLER, ULRICH, 18356 BARTH, DE
分类号 H01J37/32;H05H1/46;(IPC1-7):H05H1/46;C23F4/00 主分类号 H01J37/32
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