| 摘要 |
<p>A small field scanning photolithography system (100) uses opposing motion of a reticle (120) and a blank (160) to compensate for image reversal by a projection system (170) such as a conventional Wynne-Dyson optical system which forms a reverted image (162) on a blank. The reticle (120) has a reverted pattern (122). During scanning, reticle (120) moves along a reverted axis in a direction opposite the direction in which blank (160) moves. The opposing motions can either expose a stripe on the bland or index the reticle and blank for exposure of a next stripe. In one embodiment of the invention, reticle (120) and blank (160) are on independently movable precision air bearing stages (220, 260). Typically, movement of blank (160) and reticle (120) are equal perpendicular the reverted axis and opposite along the reverted axis. The stages (220, 260) can move reticle (120) and blank (160) different amounts to correct for shrinkage and temperature changes which cause the size of reticle (120) and blank (160) to differ.</p> |
