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发明名称
Plasma etching method
摘要
申请公布号
EP0395017(B1)
申请公布日期
1996.09.25
申请号
EP19900107870
申请日期
1990.04.25
申请人
TOKYO ELECTRON LIMITED
发明人
KOJIMA, HIROSHI;TAHARA, YOSHIFUMI;ARAI, IZUMI
分类号
H01L21/311;H01L21/3213;(IPC1-7):H01L21/311;H01L21/321;H01J37/32
主分类号
H01L21/311
代理机构
代理人
主权项
地址
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