发明名称 SUBSTRATE TREATING APPARATUS
摘要 PURPOSE: To make no need of hands and improve the work efficiency by successively store substrates, on which a film is formed in a rotary coating part, into a substrate storing port by a substrate apparatus robot and setting a plurality of substrates as one unit in a batch treatment part. CONSTITUTION: Substrates 1 are transported one by one by a substrate transporting robot 21 and coated with a coating liquid in a rotary coating part 20. Then, the substrates are heated in a heating treatment plate 27 to evaporate solvent components in the coating liquid. After that, the substrates are stored one by one by a second substrate setting robot 38 in a substrate storage port 35 of a substrate recovery part 30. Next, the substrate storage port 35 of the substrate recovery part 30 is set in a vertical thermally treating furnace 46 to carry out batch-thermal treatment for the substrates. The substrates 1 after the thermal treatment are returned for every substrate storage port 35 to the substrate recovery part 30 by a port transporting robot 42 and further returned to a substrate supplying part 10 through a second substrate setting robot 38 and the substrate transporting robot 21.
申请公布号 JPH08243466(A) 申请公布日期 1996.09.24
申请号 JP19960051137 申请日期 1996.03.08
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 OTANI MASAMI;OGAMI NOBUTOSHI
分类号 G03F7/16;B05C11/08;G03F7/30;H01L21/027;(IPC1-7):B05C11/08 主分类号 G03F7/16
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