发明名称 Pattern making and pattern drafting system
摘要 A pattern making and pattern drafting system is disclosed. The system has a pattern group, stored in memory, consisting of a plurality of patterns having prescribed base lines and base points. Commands are executed to perform prescribed processing on a reference pattern and are stored into memory, the thus stored commands then being reproduced sequentially on at least one object pattern other than the reference pattern. In reproducing a command, the target point to be processed and the amount of processing to be performed by the command are recognized by reference to existing line consisting of base lines and other lines drawn on the reference pattern and existing points consisting of base points, both end points of each existing line, and other points drawn on the reference pattern.
申请公布号 US5559709(A) 申请公布日期 1996.09.24
申请号 US19940362116 申请日期 1994.12.22
申请人 KABUSHIKI KAISHA WORLD 发明人 OHNO, JUNNOSUKE;KOHSAKA, MUNEKO;NOGUCHI, KAZUNARI;KAMIYAMA, HIROTOSHI;NISHII, KIMIKO
分类号 A41H3/00;G06F17/50;(IPC1-7):G06F17/50;G06F19/00 主分类号 A41H3/00
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