发明名称 PRODUCTION OF THIN FILM AND APPARATUS FOR PRODUCTION OF THIN FILM BY LASER VAPOR DEPOSITION METHOD
摘要 PURPOSE: To safely produce members for microwave and milliwave devices for which oxide high-temp. superconductors are used by arranging specific oxide high-temp. superconductor targets on both sides of a substrate in a vacuum chamber and depositing the thin films of the target materials on the surfaces of the substrate by irradiation with laser beams. CONSTITUTION: The MgO single crystal substrate 208 is held by a holder 210 in a vacuum chamber 204 and the oxide high-temp. superconductor targets 212a, 212b which are supported by holders 214a, 214b and consist of YBa2 Cu3 O7-x are disposed on both sides thereof. While the substrate material 208 is heated uniformly to a prescribed temp by heaters 216, 218, the substrate is rotationally moved. The laser beam 230 from a laser oscillator 222 is bisected by a prism 226. The bisected beams are introduced by mirrors 228a, 228b and condenser lenses 229a, 229b into the vacuum chamber. The targets 212a, 212b are irradiated with these beams. While the substrate 208 is moved back and forth, the thin films of the YBa2 Cu3 O7-x are formed at a uniform thickness on both surfaces thereof. The members for the microwave and milliwave devices for which the oxide high-temp. superconductors are used are stably produced.
申请公布号 JPH08246137(A) 申请公布日期 1996.09.24
申请号 JP19950074608 申请日期 1995.03.07
申请人 SUMITOMO ELECTRIC IND LTD 发明人 NAGAISHI RYUKI;ITOZAKI HIDEO
分类号 C01G1/00;C01G3/00;C23C14/28;C30B25/10;H01P7/08;H01P11/00;(IPC1-7):C23C14/28 主分类号 C01G1/00
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