发明名称 Dual tumbling barrel plating apparatus
摘要 An apparatus for plating work pieces including irregularly-shaped workpieces of various sizes with a technique known as ion vapor deposition wherein the articles are tumbled in adjacent counter-rotating barrels, a portion of which are cathodes of a high voltage system. The barrels rotate about generally horizontal axes toward anodes positioned therebetween which supply evaporated plating material.
申请公布号 US4116161(A) 申请公布日期 1978.09.26
申请号 US19760741307 申请日期 1976.11.12
申请人 MCDONNELL DOUGLAS CORPORATION 发明人 STEUBE, KENNETH E.
分类号 C23C14/22;C23C14/32;C23C14/50;(IPC1-7):C23C13/08 主分类号 C23C14/22
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