发明名称 |
Dual tumbling barrel plating apparatus |
摘要 |
An apparatus for plating work pieces including irregularly-shaped workpieces of various sizes with a technique known as ion vapor deposition wherein the articles are tumbled in adjacent counter-rotating barrels, a portion of which are cathodes of a high voltage system. The barrels rotate about generally horizontal axes toward anodes positioned therebetween which supply evaporated plating material.
|
申请公布号 |
US4116161(A) |
申请公布日期 |
1978.09.26 |
申请号 |
US19760741307 |
申请日期 |
1976.11.12 |
申请人 |
MCDONNELL DOUGLAS CORPORATION |
发明人 |
STEUBE, KENNETH E. |
分类号 |
C23C14/22;C23C14/32;C23C14/50;(IPC1-7):C23C13/08 |
主分类号 |
C23C14/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|