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发明名称
PLASMA CHAMBER
摘要
<p>Eine Vorrichtung zum Durchführen von Plasmaprozessen weist Einrichtungen (7, 13) für die Durchführung mindestens zweier unterschiedlicher Plasmaprozessarten für die Oberflächenbehandlung eines Substrates auf.</p>
申请公布号
WO1996028587(A1)
申请公布日期
1996.09.19
申请号
CH1996000094
申请日期
1996.03.13
申请人
发明人
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主分类号
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