发明名称 Mikromechanisches Halbleiterbauelement
摘要 The movable element is produced from a structural layer (7) by masking, with filled contact holes (10) between a lower metallisation plane (14,16) and insulation regions (6). It is formed on the surface of a substrate and has a covering layer (15) facing the surface across a cavity and contg. etched holes. A closure layer (21) of e.g. dielectric material is applied overall and may contain metallised contact holes. A further metallisation plane (22) may be added on the dielectric. The covering layer is supported on pillars (12) or bars (11).
申请公布号 DE19509868(A1) 申请公布日期 1996.09.19
申请号 DE1995109868 申请日期 1995.03.17
申请人 SIEMENS AG, 80333 MUENCHEN, DE 发明人 HIEROLD, CHRISTOFER, DR., 81739 MUENCHEN, DE;KLOSE, HELMUT, DR., 81929 MUENCHEN, DE;SCHEITER, THOMAS, 80469 MUENCHEN, DE;BIEBL, MARKUS, 86163 AUGSBURG, DE
分类号 G01L1/18;B81B3/00;B81B7/00;G01L9/04;G01P1/02;G01P15/08;H01L29/84;(IPC1-7):H01L49/00 主分类号 G01L1/18
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