发明名称 DEVICE AND METHOD FOR EPITAXIALLY GROWING GALLIUM DEVICE AND METHOD FOR EPITAXIALLY GROWING GALLIUM NITRIDE LAYERS NITRIDE LAYERS
摘要 An epitaxial growth system comprises a housing around an epitaxial growth chamber. A substrate support is located within the growth chamber. A gallium source introduces gallium into the growth chamber and directs the gallium towards the substrate. An activated nitrogen source introduces activated nitrogen into the growth chamber and directs the activated nitrogen towards the substrate. The activated nitrogen comprises ionic nitrogen species and atomic nitrogen species. An external magnet and/or an exit aperture control the amount of atomic nitrogen species and ionic nitrogen species reaching the substrate.
申请公布号 WO9622408(A3) 申请公布日期 1996.09.19
申请号 WO1996US01562 申请日期 1996.01.11
申请人 TRUSTEES OF BOSTON UNIVERSITY 发明人 MOUSTAKAS, THEODORE, D.;MOLNAR, RICHARD, J.
分类号 C30B23/02;H01L21/203;H01L33/00;H01L33/32 主分类号 C30B23/02
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