| 发明名称 |
STABILIZER FOR HALOGEN-CONTAINING RESINS AND PROCESS FOR THE PREPARATION THEREOF, HALOGEN-CONTAINING RESIN COMPOSITION, AND COMPOSITE HYDROXIDE SALT |
| 摘要 |
A composite hydroxide salt of the general formula: [A12(Li(1-x).Mx)(OH)6]n(A<-n>)1+x.mH2O (wherein A is an inorganic or organic anion; M is Mg and/or Zn; n is the valence of the anion A; m is 0 or a positive number; and x is a number satisfying the relationship: 0.01 </= x < 1) is added to a halogen-containing resin as a stabilizer. This hydroxide salt has a structure similar to that of a composite lithium aluminum hydroxide salt wherein a part of the lithium ions entering the vacant sites of the aluminum hydroxide octahedral layer of the gibbsite structure are replaced by Mg and/or Zn ions, and therefore can give a halogen-containing resin little suffering from initial discoloration. Further, since a part of the monovalent lithium ions are replaced by divalent metal ions, the above hydroxide salt contains an increased amount of anions compensating for the electric charge to attain heat stabilizing performance higher than that of a composite lithium aluminum hydroxide salt.
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| 申请公布号 |
WO9628508(A1) |
申请公布日期 |
1996.09.19 |
| 申请号 |
WO1996JP00569 |
申请日期 |
1996.03.08 |
| 申请人 |
FUJI CHEMICAL INDUSTRY CO., LTD.;MACHIMURA, HITOSHI;TANIGUCHI, AKIKO;MURAKAMI, TATSUO |
发明人 |
MACHIMURA, HITOSHI;TANIGUCHI, AKIKO;MURAKAMI, TATSUO |
| 分类号 |
C01B25/45;C01F7/00;C01F7/16;C01G9/00;C08K3/00;C08K3/22;C08K3/24;C08K3/26;C08K5/04;C08K5/098;C08K5/57;C08K9/04;C08L23/00;C08L27/06;C08L57/04;C08L57/08;C08L101/04;(IPC1-7):C08L27/00;C08K5/07;C08K5/053;C08K5/06;C07F5/06;C01B11/06 |
主分类号 |
C01B25/45 |
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