| 摘要 |
PURPOSE: To obtain a notch mirror-finishing device for a wafer in which the mirror polishing width executed at the chamfered part of a notch is not changed and which has high polishing efficiency and can mirror-polish even the notch of not only a V shape but also any shape. CONSTITUTION: Rotating disclike polishing clothes 10a, 10b, 10c made of foamed urethane cloth or nonwoven fabric cloth and a wafer 1 to be polished are so disposed as to cross the surfaces, and polished while dropping abrasive solution to improve the polishing efficiency. In the case of polishing the three positions of the lower surface, the end face and the upper surface, the disclike cloth is formed in the same shape when viewed from the perpendicular direction of the wafer at the time of polishing the end face, or in the shape when viewed from the direction of a chamfering angleθof the notch at the times of polishing the lower and upper surfaces previously by diamond wheels 14a, 14b, 14c thereby to improve the polishing accuracy since the mirror polishing width to be executed at the chamfered part of the notch is not changed and the shape of the cloth side is always refreshed.
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