发明名称 METHOD AND APPARATUS FOR GIVING REACTANT VAPOR TO MAKE PREFORM CONTAINING SILICON DIOXIDE
摘要 A vaporizer for halide-free, silicon-containing liquid reactants used in producing preforms is provided. The vaporizer includes a heated, vertically-oriented expansion chamber (20) and a vertical hollow shaft (42) which extends into the chamber and has a plurality of orifices (45) at its upper end (44). Preheated reactant is supplied to the vertical shaft (42) at an elevated pressure and is sprayed onto the chamber's heated wall (22) by the orifices (45). A portion of the liquid reactant vaporizes upon entering the internal volume (24) of the chamber (20) due to the pressure drop between the inside of the shaft and the inside of the chamber. The remainder of the liquid reactant vaporizes by being heated through contact with the chamber's wall (22). Higher molecular weight species present in the raw material or generated by the vaporization process are collected in the bottom portion of the chamber where they can be periodically removed. <IMAGE>
申请公布号 JPH08239226(A) 申请公布日期 1996.09.17
申请号 JP19950351273 申请日期 1995.12.27
申请人 CORNING INC 发明人 RICHIYAADO RIIDO UIRIAMUZU
分类号 G02B6/00;B01D1/22;B01D3/06;C03B8/04;C03B19/14;C03B37/014;C03B37/018;C23C16/40;C23C16/448;(IPC1-7):C03B8/04 主分类号 G02B6/00
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