| 摘要 |
PURPOSE: To obtain a chemical amplification type resist hardly increasing the number of fine particles immediately after production and even after storage over a long period of time and having high shelf stability by using a specified solvent selected from among alkyl pyruvate, ethyl-3-ethoxypropionate, etc. CONSTITUTION: A solvent selected from among alkyl pyruvate, ethyl-3- ethoxypropionate, butyl acetate and amyl acetate as the coating solvent of a chemical amplification type compsn. has superior shelf stability and solubility to both a water-soluble precursor of an acid and a highly reactive medium and can give a resist compsn. contg. a small number of fine particles. This resist compsn. consists of an alkali-soluble resin, polyvinyl phenol having acid- decomposable groups such as tetrahydropropyloxy groups, a water-soluble precursor of an acid and the selected solvent. The precursor is, e.g. a sulfonium salt such as trimethylsulfonium trifluoromethanesulfonate. |
