发明名称 METHOD AND APPARATUS FOR SURFACE TREATING
摘要 PURPOSE: To reduce the charge-up due to electron shading and to eliminate various problems due to the shading by applying the voltage of a pulse waveform having the rising speed of a specific value or more as a bias voltage. CONSTITUTION: Microwaves generated by a magnetron 18 are introduced into a discharge tube 20 via a waveguide 19, and a plasma of high density is generated by the electron cyclotron resonance of the introduced microwaves and the magnetic field formed by a coil 21. The plasma is grounded by a ground electrode 22 so that the plasma is not largely changed due to the application of the pulse. As a sample, a resist mask is formed on a polysilicon film to be used. The sample 1 is connected to an electrostatic attraction constant-voltage source 24 and a pulse power source 17 via electrostatic attraction insulating ceramic. In order to generate the pulse voltage of the rising speed of 10<3> V/μs or more, the pulse power source of the rising speed of 10<3> V/μs or more is required at the lowest.
申请公布号 JPH08241885(A) 申请公布日期 1996.09.17
申请号 JP19950045258 申请日期 1995.03.06
申请人 HITACHI LTD 发明人 KOTO NAOYUKI;TSUJIMOTO KAZUNORI;MIZUTANI TATSUMI;SUZUKI KEIZO;MIZUISHI KENICHI
分类号 C23F4/00;H01L21/302;H01L21/3065;(IPC1-7):H01L21/306 主分类号 C23F4/00
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