| 摘要 |
PURPOSE: To align a photomask with a substrate work through a simple structure even if an excimer laser is used as a light source. CONSTITUTION: An excimer laser is used as a light source in this exposure system, light 1 is selectively projected onto a photoresist film formed on a substrate work 4 through the intermediary of a photomask 2, wherein an aligning mark 2A is provided onto the photomask 2, and a substrate capable of being replaced with the substrate work 4 corresponding positionally to it and emitting fluorescence from a spot where the aligning mark 2a of the photomask 2 is projected and a means which aligns the photomask with the substrate work basing on the fluorescence emitting spot of the substrate are provided. |
