发明名称 RESIST APPLICATION DVELOPMENT DEVICE
摘要 PURPOSE: To restrain chemical droplets from adhering to t,he surface of a semiconductor substrate kept on standby in an interface section by a method wherein a cover provided above the interface section is fitted with an extension which extends downwards from its edge on a spinner side. CONSTITUTION: A cover 15 is equipped with extensions 15a, 15b, and 15c which extend downwards from its side edges on a spinner section 11 side. A semiconductor substrate 13 kept on standby in an interface section 14 is subjected to a cleaning process and a resist applying process in a spinner section 11, and even if chemical droplets which are spouted drifting in a flow of air in the spinner section 11 fall down in the boundary region of the spinner section 11 with the interface section 14, the droplets are prevented from penetrating through the interface section 14 by the extensions 15a, 15b, and 15c of the cover 15. By this setup, chemical droplets are prevented from adhering to the surface of the semiconductor substrate 13 on standby in the interface section 14.
申请公布号 JPH08241854(A) 申请公布日期 1996.09.17
申请号 JP19950070659 申请日期 1995.03.03
申请人 MITSUMI ELECTRIC CO LTD 发明人 SONEHARA SHINICHI
分类号 G03F7/16;G03F7/30;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/16
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