| 摘要 |
<p>PURPOSE: To provide substrate treatment device and method for preventing a substrate on a retention part from deviating horizontally and positively performing treatment. CONSTITUTION: Both vacuum chucks of a circular-plate-shaped retention part 3 and an annular retention part 4 are activated for a period of time, for example, approximately 0.1-0.5 seconds, when passing a substrate 2 between the circular-plate-shaped retention part 3 and the annular retention part 4.</p> |
