| 摘要 |
An interval detection method for detecting the interval between two marks provided on the surface of a wafer with high accuracy using other two marks provided on the wafer, and a method for detecting the relative positions of a wafer and a mask with high accuracy are provided. The method for detecting the interval includes the steps of projecting a first light beam passing through a first mark on the mask and a fifth mark on the wafer onto a predetermined detection surface, projecting a second light beam passing through a second mark on the mask and a sixth mark on the wafer onto the predetermined detection surface, projecting a third light beam passing through a third mark on the mask and the fifth mark onto the predetermined detection surface, projecting a fourth light beam passing through a fourth mark on the mask and the sixth mark onto the predetermined detection surface, and determining the interval between the first mark and the second mark based on information relating to the incident positions of the first, second, third and fourth light beams on the predetermined detection surface, and the interval between the third mark and the fourth mark.
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