发明名称 POSITIVE TYPE RESIST COMPOSITION
摘要 PURPOSE: To obtain a resist compsn. excellent in heat resistance and resolution and not practically generating scum by using a specified novolak resin as alkali- soluble novolak resin. CONSTITUTION: In this resist compsn. contg. alkali-soluble novolak resin and a compd. having a quinonediazido group, the novolak resin is an alkali-soluble novolak resin having a wt. average mol.wt. of 2,000-15,000 separated from a reactional product obtd. by bringing phenol and aldehyde into a reaction in aγ-butyrolactone solvent in the presence of an acidic catalyst and this resist compsn. does not practically generate scum. Such alkali-soluble novolak resin can be used for a positive type resist as it is but a low mol.wt. part is removed so that the wt. average mol.wt. is regulated to 2,000-15,000, preferably 4,000-10,000.
申请公布号 JPH08234420(A) 申请公布日期 1996.09.13
申请号 JP19950037308 申请日期 1995.02.24
申请人 TOKYO OHKA KOGYO CO LTD 发明人 KONO SHINICHI;ONO ISATO;OBARA HIDEKATSU;NAKAYAMA TOSHIMASA
分类号 G03F7/022;C08G8/08;C08L61/04;C08L61/06;G03F7/023;H01L21/027;(IPC1-7):G03F7/022 主分类号 G03F7/022
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