| 摘要 |
PURPOSE: To ensure satisfactory suitability to patterning by i-line stepper exposure by using a chemical ray-sensitive polymer compsn. contg. a specified polymer and specifying the light transmissivity of a prebaked film of the compsn. CONSTITUTION: This chemical ray-sensitive polymer compsn. contains a polymer consisting essentially of structural units represented by the formula and the light transmissivity of a prebaked film of this compsn. having 10μm thickness at 365nm wavelength is regulated to $13%. In the formula, R<1> is a tri- or tetravalent >=2C org. group, R<2> is a divalent $12C org. group, R<3> is H, an alkali metal ion, ammonium ion or a 1-30C org. group and (n) is 1 or 2. The polymer is, e.g. a polymer convertible into a polymer having imido rings or other cyclic structure (polyimide type polymer) by heating or in the presence of a proper catalyst. |
