发明名称 POSITIVE TYPE RADIATION SENSITIVE RESIN COMPOSITION
摘要 PURPOSE: To shorten the wavelength of light absorbed in a compsn., to make the compsn. adaptable to the shortening of the wavelength of light from a light source for exposure, to ensure high resolution and to attain application to a fine working technique by incorporating an alkali-soluble resin and a specified 1,2-naphthoquinonediazido compd. as a photosensitive agent as essential components. CONSTITUTION: An alkali-soluble resin and a 1,2-naphthoquinonediazido compd. represented by formula I as a photosensitive agent are incorporated as essential components. In the formula I, (n) is 1 or 2, X is hydroxyl, a 1-4C lower alkyl, 2-4C lower alkenyl, 6-10C aryl, 2-4C lower alkoxy, a group represented by formula II or a group represented by formula II. In the formulae II, III, Y is a 1-4C lower alkyl, 2-4C lower alkenyl, 2-4C alkoxy or 6-10C aryl, R is 1,2- naphthoquinone-2-diazidosulfonyl or H and at least one of R's is 1,2- naphthoquinone-2-diazidosulfonyl.
申请公布号 JPH08234438(A) 申请公布日期 1996.09.13
申请号 JP19950061642 申请日期 1995.02.24
申请人 SHIN ETSU CHEM CO LTD 发明人 UMEMURA MITSUO;KANBARA HIROSHI;UEDA TAKASHI;KOBAYASHI YOSHITAKA;OKAZAKI SATOSHI
分类号 G03F7/022;G03F7/075;H01L21/027;(IPC1-7):G03F7/075 主分类号 G03F7/022
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