| 摘要 |
<p>PURPOSE: To make it possible to easily detect pattern missing between shots in a designing stage by subjecting cmposted reversal image data to reversal processing in accordance with the information on the size of a panel to form image data for inspection and detecting defects. CONSTITUTION: The design data for photomasks divided into four shots of parts A to D are respectively subjected to subtraction (reversal (OR)) processing from light shielding films 1b of the same size as the size of the design data for photomasks of the parts A to D to generate the reversal image data. Next, the reversal image data are subjected to compositing processing in accordance with the panel position information to be subjected to a shot composition to generate the composited reversal image data. Next, the composited reversal image data are subjected to subtraction (reversal (OR)) processing from the light shielding films of the same size as the size of the composited reversal image data to generate the image data for inspection. The generated image data for inspection are outputted onto a CAD and the patterns are visually checked in accordance with the image data for inspection outputted onto this CAD, thereby, the defects are detected.</p> |
