| 摘要 |
PURPOSE: To obtain the manufacturing method, of an optical disk, in which a good-reproducibility VO2 thin film having a good surface state can be formed at room temperature. CONSTITUTION: First, a vanadium thin film is formed on a substrate by a sputtering operation. Then, the substrate 1 on which the vanadium film has been formed is connected to an anode (+ pole) 23, an electrode which is composed of platinum or stainless steel is connected to a cathode (- pole) 24, and the anode 23 is arranged in such a way that the vanadium film is faced with the cathode 24 by keeping an interval (d) in an electrolytic solution 22 composed mainly of acetic acid. Then, a prescribed voltage and a prescribed current are made to flow across the anode 23 and the cathode 24 for a prescribed time, an electrolytic operation is performed, and the vanadium film is oxidized in the electrolytic solution 22 so as to be changed into a VO2 film. |
