摘要 |
<p>PROBLEM TO BE SOLVED: To enable photoresist solution to be accurately controlled in pressure and volume and then sprayed, whereby residual solution leakage is optimally reduced after spraying. SOLUTION: A spray liquid supply controlling means 50 equipped with a core member 102, a nozzle body 100, and an electronic coil 108 which drives the core member 102 is mounted on the rear side end of a photoresist solution feed pipe 15. Spray liquid is accurately controlled in pressure and volume by the controlling means 50 so as to meet the characteristics of photoresist solution and sprayed onto a semiconductor element, whereby the photoresist solution leakage is optimally reduced after spraying.</p> |