| 摘要 |
A mask having a mask pattern (3) with multiple steps is provided, as are methods of forming a pattern and implanting ions using such a mask. In a mask for transcribing a mask pattern on a semiconductor substrate using light, the mask pattern includes a gray-tone mask pattern (3,103,105,107,109) in which optical transmittance is selectively varied, so that the transmittance of light passing through the mask is controlled to vary in a selective manner. When implanting ions after forming an ion implanting mask pattern on a semiconductor substrate using such a mask, the depth of ions implanted on the semiconductor substrate can be varied, and the number of masks required for frequent ion implantation processes can be reduced. <IMAGE> <IMAGE> |
