发明名称 DEVICE AND METHOD FOR POLISHING FOREIGN MATTER
摘要 PURPOSE: To prevent overcutting due to polishing by providing a polishing mechanism for polishing foreign matter and a protecting film forming mechanism of forming a protcting film with a resin in a substrate surface. CONSTITUTION: First in visual inspection of a color filter substrate 20, in a part of foreign matter discovered to be judged inferior, a water soluble resin 38 serving as a protecting film is applied by a spray 35 through a mask 37 of drilling a hole in size of the protecting film desired to be formed. The fixed protecting film is immediately dried by warm air, to perform a precure and the next polishing. In polishing foreign matter, as an abrasive material, a polishing tape 27 of applying a coating of oxidized aluminum is used, and while winding this tape 27, a polishing head 26 is gradually lowered down, to end polishing in the point of time touching the protecting film. By performing polishing thus obtained, the foreign matter is polished equal to or less than thickness of the protecting film.
申请公布号 JPH08229798(A) 申请公布日期 1996.09.10
申请号 JP19950038004 申请日期 1995.02.27
申请人 FUJITSU LTD 发明人 IKEDA MASAHIRO
分类号 G02B5/20;B24B21/00;G02F1/1335;G02F1/136;G02F1/1368 主分类号 G02B5/20
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