| 摘要 |
PURPOSE: To form a uniform deposited film of good quality in the deposited film-forming device to form a deposited film on a substrate by forming the inlet part of a high-frequency power introducing means as an electrode with plural members. CONSTITUTION: A cylindrical conductive substrate 101 is provided in a reaction vessel 100 capable of being evacuated through an exhaust pipe 105, a raw gas is introduced from a raw gas feed pipe 103, a power is impressed on a high-frequency power introducing part 102 from a high-frequency power source 107 to decompose the raw gas, and a deposited film is formed on the substrate 101. At this time, a conductive member is used as the base body of the power introducing part 102, the member is coated with a ceramic material, stainless steel, Al, Ti, etc., are used for the base body, Al2 O3 , BN, AlN, etc., are employed for the ceramic material, and the thickness of the ceramic material is controlled to 10μm to 5mm. Consequently, a deposited film reduced in structural defects is formed on the substrate 101 by this film forming device.
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