发明名称 Method and device for controlling exposure for fluorescence microphotography
摘要 In photographic recordings made by fluorescence microscopy, it is possible for a bleaching out of the preparation to occur, associated with a loss of fluorescence intensity. This so-called "fading" demands an exposure time correction. Where there is a decrease of the light intensity which obeys a known function, exposure takes place over a first exposure time T1 derived from the light intensity I1 measured prior to the exposure. The exposure process is then interrupted, and a further intensity I2 is measured. Then, if required, exposure takes place over a further exposure time T2, computed from I1, I2 and T1. In this way, in each instance, all of the light of the photographic beam path passes both to the sensor for measurement for measuring intensities and also to the film for exposure. To deflect the photographic beam path, a rotatable mirror is disposed in the beam path, which mirror is controllable by means of a central processor, in the same manner as a shutter. An apparatus for carrying out this photographic process is described.
申请公布号 US5555070(A) 申请公布日期 1996.09.10
申请号 US19930107141 申请日期 1993.08.17
申请人 LEICA MIKROSKOPIE UND SYSTEME GMBH 发明人 HERMANN, FRANK
分类号 G02B21/36;G02B21/00;G03B7/08;G03B7/093;(IPC1-7):G03B7/00 主分类号 G02B21/36
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