Mid and deep-UV antireflection coatings and methods for use thereof
摘要
An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
申请公布号
US5554485(A)
申请公布日期
1996.09.10
申请号
US19940315271
申请日期
1994.09.29
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
DICHIARA, ROBERT R.;FAHEY, JAMES T.;JONES, PAMELA E.;LYONS, CHRISTOPHER F.;MOREAU, WAYNE M.;SOORIYAKUMARAN, RATNAM;SPINILLO, GARY T.;WELSH, KEVIN M.;WOOD, ROBERT L.