发明名称 GAS TREATING DEVICE
摘要 <p>PURPOSE: To provide a gas treating device in which harmful gas such as gaseous ammonia is not required, and an influence of the gas composition of a gas to be treated on the treating efficiency is small, and besides components to be treated in the gas to be treated are effectively decomposed and are made harmless without secondary wastes being formed. CONSTITUTION: A device is provided with a adsorptive part for introducing a gas to be treated containing components to be treated to adsorb them on a adsorbent 9, and a discharge part for making decomposition treatment by discharge in a state in which the components to be treated adsorbed on the adsorbent 4 or adsorbed and desorbed on and from the adsorbent 4 do not keep being introduced. The adsorptive part 3 and the discharge part occupy the same space, and the gas to be treated containing components to be treated is introduced into this space of adsorption and discharge to adsorb the components to be treated on the adsorbent 4, and the gas to be treated is stopped being introduced to decompose the components to be treated adsorbed on the adsorbent by discharge. The discharge part is arranged downstream of the adsorptive part, and also a means for desorbing the component to be treated adsorbed on the adsorbent is installed.</p>
申请公布号 JPH08229345(A) 申请公布日期 1996.09.10
申请号 JP19950040365 申请日期 1995.02.28
申请人 MITSUBISHI ELECTRIC CORP 发明人 OI TAKESHI;HORIGUCHI GOJI;KIKUNAGA TOSHIYUKI
分类号 B01D53/34;B01D53/32;B01D53/81;(IPC1-7):B01D53/32 主分类号 B01D53/34
代理机构 代理人
主权项
地址