发明名称 PLASMA ION SOURCE
摘要 FIELD: analytical chemistry; elementary analyses of liquids and gases, ion technology, etc. SUBSTANCE: plasma ion source has discharge chamber with inlet slit, with analyzed sample feeding device placed along its central axis through insulator and made in the form of capillary tube, high-voltage supply, and ion drawing and focusing system. EFFECT: improved sensitivity of liquid and gas analyses, simplified design and reduced cost of equipment.
申请公布号 RU94022102(A) 申请公布日期 1996.09.10
申请号 RU19940022102 申请日期 1994.06.16
申请人 INSTITUT PROBLEM TEKHNOLOGII MIKROEHLEKTRONIKI I OSOBOCHISTYKH MATERIALOV RAN 发明人 SIKHARULIDZE G.G.;LEZHNEV A.E.
分类号 H01J27/02;H01J49/26 主分类号 H01J27/02
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