发明名称 ANTISTATIC FILM SUBSTRATE AND PHOTOGRAPHIC COMPONENT CONTAINING THE ANTISTATIC FILM SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide a photographic film base provided by using an antistatic layer and a photosensitive photographic element including the same. SOLUTION: An antistatic film base contains a polymer film base having an antistatic layer applied to at least the single surface thereof and the antistatic layer contains a reaction product of a water soluble electric conductive polymer containing a carboxyl group and a water soluble polymer containing an oxazoline group.</p>
申请公布号 JPH08230091(A) 申请公布日期 1996.09.10
申请号 JP19960002939 申请日期 1996.01.11
申请人 MINNESOTA MINING & MFG CO <3M> 发明人 ARUBERUTO BARUSETSUKI;RENZO TORUTEROORO;JIYORUJIO SUPATSUTSUAPAN;SUUNKUN ESU KAN
分类号 B32B7/02;B32B27/32;C08G73/02;C09D137/00;C09D139/04;C09D201/00;C09K3/16;G03C1/89;(IPC1-7):B32B7/02 主分类号 B32B7/02
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