| 摘要 |
PROBLEM TO BE SOLVED: To provide the structure of an alternate element phase shift mask and its fabrication. SOLUTION: All mask pattern elements extended in the X-direction are formed on a first mask board, and all mask pattern elements extended in the Y-direction are formed on a second mask board. Two mask boards are combined into a single mask for the single exposing process on a wafer, or individual masks are separately exposed, and they are overlapped on a single mask wafer. |
