发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 PURPOSE: To obtain a radiation sensitive resin compsn. having high resolving power, high sensitivity and a wide defocus latitude. CONSTITUTION: This radiation sensitive resin compsn. contains a water-insoluble but alkali-soluble resin and a radiation sensitive compd. On an R-M characteristic curve showing the relation between the solution velocity R(μm/sec) of this compsn. and the concn. M of the relatively residual radiation sensitive compd. at the time of development with 2.38wt.% aq. soln. of tetramethylammonium hydroxide at 23 deg.C, the difference dM between the value of M in the case of R=0.02μm/sec and the value of M in the case of R=0.002μm/sec is <=0.1.
申请公布号 JPH08227160(A) 申请公布日期 1996.09.03
申请号 JP19950032571 申请日期 1995.02.21
申请人 FUJI PHOTO FILM CO LTD 发明人 SAKAGUCHI SHINJI;KATOU KUNIMASA
分类号 G03F7/022;G03F7/36;(IPC1-7):G03F7/36 主分类号 G03F7/022
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