发明名称 |
RADIATION SENSITIVE RESIN COMPOSITION |
摘要 |
PURPOSE: To obtain a radiation sensitive resin compsn. having high resolving power, high sensitivity and a wide defocus latitude. CONSTITUTION: This radiation sensitive resin compsn. contains a water-insoluble but alkali-soluble resin and a radiation sensitive compd. On an R-M characteristic curve showing the relation between the solution velocity R(μm/sec) of this compsn. and the concn. M of the relatively residual radiation sensitive compd. at the time of development with 2.38wt.% aq. soln. of tetramethylammonium hydroxide at 23 deg.C, the difference dM between the value of M in the case of R=0.02μm/sec and the value of M in the case of R=0.002μm/sec is <=0.1. |
申请公布号 |
JPH08227160(A) |
申请公布日期 |
1996.09.03 |
申请号 |
JP19950032571 |
申请日期 |
1995.02.21 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
SAKAGUCHI SHINJI;KATOU KUNIMASA |
分类号 |
G03F7/022;G03F7/36;(IPC1-7):G03F7/36 |
主分类号 |
G03F7/022 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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